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R&D Implant Service

Core's R&D Implant Service has had over 15 years of technology development in the production of non-traditional and exotic ion species utilizing a variety of substrates. This includes a capability to implant into unusual and irregularly shaped substrates with over 70 different ion species.

Capability includes ability to implant <2Ó- 6Ó wafers and a 6Ó band on an 8Ó wafers
GaAs and other III_V substrates are regularly implanted with 28Si, 29Si, Zn, Be, Mg, H, He, and O
Energy from 5Kev to 400KeV single charge
High tilt angles to 89 degrees

All the R&D implanters are calibrated to NIST traceable standards and CorMap, optical dosimetry, is used to regularly match dose and uniformity.

Standard turn around for R&D implants is 3-5 days but with advanced notice, same-day cycle time can be arranged.

Species Available to Implant

[periodic table of elements]

Download a copy of the periodic chart here.

Request a quote here.

List of Species

H	BeF	Mn (up to 200keV)	Ag
D	CO	Fe (up to 200keV)	Cd
Li	Si	Co (up to 200keV)	In
Be	Si29	Ni (up to 200keV)	Sn
B	Si30	Cu	Sb
C	BF	Zn	Te (up to 185keV)
C13	P	BF3	I
N	O2	Ga	Xe
N15	S	Ge	Cs
O	Ci	As	Ba
O18	Ar	Se	Er
H20	K	Br	Ta
F	Ca	Kr	W
Ne	SiF	Sr	Pt
Na	Sc	SiF3	Au
Mg	Ti	Y	Hg
Al	BF2	Zr	Pb
N2	Cr	Mo	Bi

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